Aller au menu Aller au contenu
MASTER NANOTECH
Master's Degree in Micro and Nano Technologies for Integrated Systems
MASTER NANOTECH
MASTER NANOTECH

> Courses > ECTS

Advanced lithography - 4PMTADL2

A+Augmenter la taille du texteA-Réduire la taille du texteImprimer le documentEnvoyer cette page par mail Partagez cet article Facebook Twitter Linked In Google+ Viadeo
  • Number of hours

    • Lectures : 6.0
    • Tutorials : 6.0
    • Laboratory works : ?
    • Projects : ?
    • Internship : ?
    ECTS : 1.0

Goals

Contact à préciser ENSEIGNANT

Content

1.Optical lithography:
1.1. Description of a standard scanner
1.2. Phenomenological description of image formation
1.3. Lithography criteria: Resolution, depth of focus, line edge roughness, ..
2. Trends in optical lithography: Resolution Enhancement Techniques:
2.1. Immersion Lithography
2.2. Double patterning
2.3. Optical Proximity effects Correction (OPC)
2.4. Advanced masks
3. Next Generation lithography:
3.1. Extreme UltraViolet (EUV)
3.2. Imprint
3.3. Directed Self Assembly
3.4. Direct electron beam writing
4. Focus on e-beam lithography technique (by Jonathan Pradelles, CEA-Leti)
4.1. e-beam writer description
4.2. Physics of electron/matter interaction
4.3. OPC in e-beam lithography



Prerequisites

Tests

Semester 8 - The exam is given in english only 



Additional Information

Semester 8 - This course is given in english only EN

Curriculum->NANOTECH->Semester 8

A+Augmenter la taille du texteA-Réduire la taille du texteImprimer le documentEnvoyer cette page par mail Partagez cet article Facebook Twitter Linked In Google+ Viadeo

Date of update March 13, 2019

Grenoble INP Institut d'ingénierie Univ. Grenoble Alpes