NanotechLabs

The aim of these series of lab works is to show the techniques used in microelectronics technology and more specifically those used to elaborate Microsystems (MEMS). By going through the entire process flow, including simulation, realization, characterization, theses hands on will give a general overview of the standard and the specific methods and techniques used to elaborate modern complex integrated circuits.

Each lab work is 4 hours long. These lab works are divided in four parts:

• Technology (T): elaboration of the devices in clean room. Using a four mask process, the goal is to fabricate simple
   

• • Microelectronic devices: resistors, diodes, MOS capacitors, NMOS transistors...
     
  • MEMS devices: pressure sensors, micro-mirrors, cantilevers, bridges, suspended inductances...
  • Test structures to measure: material electrical resistance (4 point probes), photolithography misalignments, crystallographic orientation etching dependence... 

• Characterization (C): to extract the devices properties of MEMS, diodes, MOS capacitors and transistors.
   

• Simulation (S): using commercial simulators, to have a better insight of the technology, electrical and electro-mechanical properties of selected components.
   

• Nanotechnology (N): near-field microscopy, including STM, AFM, nanomanipulator...

Of all the devices that you will make and characterize, we will mainly focus on two:

• a pressure sensor
• a MOSFET transistor

Contact

• Youla Morfouli