Advanced lithography - 4PMTADL2

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Number of hours
- Lectures : 6.0
- Tutorials : 6.0
- Laboratory works : 0
- Projects : 0
- Internship : 0
ECTS : 2.0

Goals

Contact Bertrand LE GRATIET

Content

1.Optical lithography:
1.1. Description of a standard scanner
1.2. Phenomenological description of image formation
1.3. Lithography criteria: Resolution, depth of focus, line edge roughness, ..
2. Trends in optical lithography: Resolution Enhancement Techniques:
2.1. Immersion Lithography
2.2. Double patterning
2.3. Optical Proximity effects Correction (OPC)
2.4. Advanced masks
3. Next Generation lithography:
3.1. Extreme UltraViolet (EUV)
3.2. Imprint
3.3. Directed Self Assembly
3.4. Direct electron beam writing
4. Focus on e-beam lithography technique (by Jonathan Pradelles, CEA-Leti)
4.1. e-beam writer description
4.2. Physics of electron/matter interaction
4.3. OPC in e-beam lithography